Shrinking size of ICs with highly complex layouts containing billions of transistors and miles of interconnects....all of this doesn't sound new now. The industry has been pretty fast in adopting advanced node designs and has witnessed various innovations to overcome the challenges faced at this level. One of the challenges is accurate and timely analysis of the effects of electromigration (EM) and IR drop, and faster clearance of physical verification of transistor-level designs. In-design electromigration analysis, a unique feature of Virtuoso Layout Suite, helps you address this challenge. Read more...(read more)![]()
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